摘 要
本研究以FCD450延性鑄鐵為素材，進行沃斯回火處理得到沃斯回火延性鑄鐵(ADI)，使用陰極電弧沉積(CAD)技術在ADI表面披覆(TiCrCuAlSi)N多元氮化陶瓷硬膜，變化鍍膜製程偏壓參數作為本實驗變因，用以得到不同元素含量比之陶瓷硬膜，偏壓值分別使用(50V、100V及150V)，以探討不同偏壓值薄膜對ADI耐腐蝕性之影響。
實驗結果顯示 (1)在附著性方面，利用Rockwell-C硬度機壓痕來判定，其中偏壓值為50V的膜層剝落情形較嚴重，有明顯的片狀剝落情形，對照規範其薄膜附著性為HF4；而隨著偏壓值上升至150V薄膜具有最佳的附著性HF2。(2)在耐腐蝕性方面，經過極化試驗得知，與未鍍膜的試片(Rp：31159Ω‧cm2)相比，ADI披覆(TiCrCuAlSi)N多元氮化物膜層處理者，其耐蝕性亦有明顯的改善，其中又以偏壓值為150V (Rp：86892Ω‧cm2)表現較佳。關鍵詞：沃斯回火延性鑄鐵、陰極電弧沉積、(TiCrCuAlSi)N陶瓷硬膜、附著性、耐蝕性
ABSTRACT
In this study, FCD450 ductile cast iron was used as the raw material for austempering treatment to obtain austempered ductile iron (ADI), and the cathodic arc deposition (CAD) technique was used to coat (TiCrCuAlSi)N multi-nitride ceramic hard films on the surface of ADI. The bias parameter of the coating process was varied as the variable of the present experiments, which was used to obtain the ceramic hard film with different elemental content ratios, and the bias values were used respectively (50V, 100V, and 150V), in order to explore the effect of the films with different bias values on the corrosion resistance of the ADI.The experimental results showed that (1) In terms of adhesion, using the Rockwell-C hardness machine indentation to determine, where the bias value of 50V film layer peeling was more serious, there were obvious flakes; and with the bias value up to 150V film had the best adhesion. (2) In terms of corrosion resistance, the polarization tests showed that compared with the uncoated specimen, the corrosion resistance of the ADI coated (TiCrCuAlSi)N multi-nitride film layer was significantly improved, and the performance of the bias value of 150V was the best.Keywords: Austempered ductile iron, Cathodic arc deposition, (TiCrCuAlSi)N ceramic film, Adhesion, Corrosion resistance